Invention Grant
US08398868B2 Directed self-assembly of block copolymers using segmented prepatterns
有权
使用分段预制图的嵌段共聚物的定向自组装
- Patent Title: Directed self-assembly of block copolymers using segmented prepatterns
- Patent Title (中): 使用分段预制图的嵌段共聚物的定向自组装
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Application No.: US12468391Application Date: 2009-05-19
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Publication No.: US08398868B2Publication Date: 2013-03-19
- Inventor: Joy Cheng , Kafai Lai , Wai-Kin Li , Young-Hye Na , Charles Rettner , Daniel P. Sanders
- Applicant: Joy Cheng , Kafai Lai , Wai-Kin Li , Young-Hye Na , Charles Rettner , Daniel P. Sanders
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agent Daniel E. Johnson
- Main IPC: B44C1/22
- IPC: B44C1/22 ; H01L21/302 ; H01L21/312

Abstract:
An opening in a substrate is formed, e.g., using optical lithography, with the opening having sidewalls whose cross section is given by segments that are contoured and convex. The cross section of the opening may be given by overlapping circular regions, for example. The sidewalls adjoin at various points, where they define protrusions. A layer of polymer including a block copolymer is applied over the opening and the substrate, and allowed to self-assemble. Discrete, segregated domains form in the opening, which are removed to form holes, which can be transferred into the underlying substrate. The positions of these domains and their corresponding holes are directed to predetermined positions by the sidewalls and their associated protrusions. The distances separating these holes may be greater or less than what they would be if the block copolymer (and any additives) were to self-assemble in the absence of any sidewalls.
Public/Granted literature
- US20100294740A1 Directed self-assembly of block copolymers using segmented prepatterns Public/Granted day:2010-11-25
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