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US08399045B2 Film formation method and film formation apparatus 有权
成膜方法和成膜装置

Film formation method and film formation apparatus
Abstract:
A film formation method according to the present invention includes the step of forming a film of material powders 7 by introducing a carrier gas 5 to a first chamber 8 accommodating the material powders 7 intermittently and mixing the material powders 7 and the carrier gas 5 to generate a first aerosol, introducing the first aerosol to a second chamber 9 to generate a second aerosol, and jetting the second aerosol to a third chamber 13 to form a film of the material powders 7.
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