Invention Grant
- Patent Title: Film formation method and film formation apparatus
- Patent Title (中): 成膜方法和成膜装置
-
Application No.: US12673907Application Date: 2008-07-22
-
Publication No.: US08399045B2Publication Date: 2013-03-19
- Inventor: Keiichi Takahashi , Shinji Mino , Tsunenori Yoshida
- Applicant: Keiichi Takahashi , Shinji Mino , Tsunenori Yoshida
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: McDermott Will & Emery LLP
- Priority: JP2007-269182 20071016
- International Application: PCT/JP2008/001954 WO 20080722
- International Announcement: WO2009/050835 WO 20090423
- Main IPC: B05D1/12
- IPC: B05D1/12

Abstract:
A film formation method according to the present invention includes the step of forming a film of material powders 7 by introducing a carrier gas 5 to a first chamber 8 accommodating the material powders 7 intermittently and mixing the material powders 7 and the carrier gas 5 to generate a first aerosol, introducing the first aerosol to a second chamber 9 to generate a second aerosol, and jetting the second aerosol to a third chamber 13 to form a film of the material powders 7.
Public/Granted literature
- US20110070359A1 FILM FORMATION METHOD AND FILM FORMATION APPARATUS Public/Granted day:2011-03-24
Information query