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US08399312B2 Methods of forming radiation-hardened semiconductor structures 有权
形成辐射硬化半导体结构的方法

Methods of forming radiation-hardened semiconductor structures
Abstract:
A radiation-hardened semiconductor structure including an insulator material doped with at least one of a transition metal, a lanthanide, and an actinide, and a semiconductor material located over the insulator material. A semiconductor device including the radiation-hardened semiconductor structure is also disclosed, as are methods of forming the radiation-hardened semiconductor structure and the semiconductor device.
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