Invention Grant
- Patent Title: Phosphorus containing novalac phenol resins, methods for manufacturing the same, and formulae containing the same
- Patent Title (中): 含有诺瓦克酚酚树脂的磷,其制造方法和含有它的化学式
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Application No.: US13021447Application Date: 2011-02-04
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Publication No.: US08399576B2Publication Date: 2013-03-19
- Inventor: Shang-Wei Tang , Hsueh-Tso Lin , Kuan-Ching Chen , Dick Zhong
- Applicant: Shang-Wei Tang , Hsueh-Tso Lin , Kuan-Ching Chen , Dick Zhong
- Applicant Address: TW Taipei
- Assignee: Grand Tek Advance Material Science Co., Ltd.
- Current Assignee: Grand Tek Advance Material Science Co., Ltd.
- Current Assignee Address: TW Taipei
- Agency: Muncy, Geissler, Olds & Lowe, PLLC
- Priority: TW100100285 20110105
- Main IPC: C08G2/30
- IPC: C08G2/30

Abstract:
Disclosed is a phosphorous containing phenol novolac resin, having a structure as below: In the above formula, Z is selected from — or —CH2—. Each Y is independently selected from —, —CH2—, —C(CH3)2—, —S—, —SO2—, —O—, —CO—, or —N═N—. Each X is independently selected from a hydrogen or phosphorous containing group, wherein the hydrogen and phosphorous containing group have a molar ratio of 1:0.1 to 0.1:1. Each R1 is independently selected from a hydrogen or C1-5 alkyl group. Each R2 is independently selected from a C1-5 alkyl group. m is an integer of 1 to 10, and n is 0 or 1.
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