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US08399861B2 Lithography apparatus using extreme UV radiation and having a volatile organic compounds sorbing member comprising a getter material 有权
使用极紫外辐射的光刻设备并具有包含吸气材料的挥发性有机化合物吸附构件

  • Patent Title: Lithography apparatus using extreme UV radiation and having a volatile organic compounds sorbing member comprising a getter material
  • Patent Title (中): 使用极紫外辐射的光刻设备并具有包含吸气材料的挥发性有机化合物吸附构件
  • Application No.: US12812948
    Application Date: 2009-02-10
  • Publication No.: US08399861B2
    Publication Date: 2013-03-19
  • Inventor: Paolo Manini , Andrea Conte
  • Applicant: Paolo Manini , Andrea Conte
  • Applicant Address: IT Lainate (MI)
  • Assignee: Saes Getters S.p.A.
  • Current Assignee: Saes Getters S.p.A.
  • Current Assignee Address: IT Lainate (MI)
  • Agency: Steinfl & Bruno, LLP
  • Priority: ITMI2008A0282 20080222
  • International Application: PCT/EP2009/051516 WO 20090210
  • International Announcement: WO2009/103631 WO 20090827
  • Main IPC: C23C14/56
  • IPC: C23C14/56 ;  G03B27/52
Lithography apparatus using extreme UV radiation and having a volatile organic compounds sorbing member comprising a getter material
Abstract:
A lithography apparatus (10) is disclosed using extreme UV radiation and having a hydrocarbon sorbing member comprising a getter material arranged in the process chamber (13) of said apparatus.
Abstract(Chinese):

公开了一种光刻设备（10），其使用极紫外辐射并且具有包含布置在所述设备的处理室（13）中的吸气剂材料的烃吸附构件。

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