Invention Grant
- Patent Title: Vertical nonvolatile memory device including a selective diode
- Patent Title (中): 包括选择二极管的垂直非易失性存储器件
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Application No.: US13008007Application Date: 2011-01-17
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Publication No.: US08399874B2Publication Date: 2013-03-19
- Inventor: Cheol Seong Hwang
- Applicant: Cheol Seong Hwang
- Applicant Address: KR Seoul
- Assignee: SNU R&DB Foundation
- Current Assignee: SNU R&DB Foundation
- Current Assignee Address: KR Seoul
- Agency: William Park & Associates Ltd.
- Main IPC: H01L29/033
- IPC: H01L29/033

Abstract:
Provided are a vertical nonvolatile memory device and a method for fabricating the vertical nonvolatile memory device. The vertical nonvolatile memory device can be integrated more highly as compared with a nonvolatile memory device of the related art. In addition, since the vertical nonvolatile memory device includes a selective diode, reading errors can be prevented.
Public/Granted literature
- US20120181498A1 VERTICAL NONVOLATILE MEMORY DEVICE AND METHOD FOR FABRICATING THE SAME Public/Granted day:2012-07-19
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