Invention Grant
US08399987B2 Microelectronic devices including conductive vias, conductive caps and variable thickness insulating layers 有权
微电子器件包括导电通孔,导电帽和可变厚度绝缘层

Microelectronic devices including conductive vias, conductive caps and variable thickness insulating layers
Abstract:
Microelectronic devices include a conductive via that extends into a substrate face and that also protrudes beyond the substrate face to define a conductive via end surface and a conductive via sidewall that extends from the end surface towards the substrate face. A conductive cap is provided on the end surface, the conductive cap including a conductive cap body that extends across the end surface and a flange that extends from the conductive cap body along the conductive via sidewall towards the substrate face. Related fabrication methods are also described.
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