Invention Grant
- Patent Title: Field emission cathode device and method for making the same
- Patent Title (中): 场发射阴极装置及其制造方法
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Application No.: US13076914Application Date: 2011-03-31
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Publication No.: US08400052B2Publication Date: 2013-03-19
- Inventor: Peng Liu , Hai-Yan Hao , Shou-Shan Fan
- Applicant: Peng Liu , Hai-Yan Hao , Shou-Shan Fan
- Applicant Address: CN Beijing TW New Taipei
- Assignee: Tsinghua University,Hon Hai Precision Industry Co., Ltd.
- Current Assignee: Tsinghua University,Hon Hai Precision Industry Co., Ltd.
- Current Assignee Address: CN Beijing TW New Taipei
- Agency: Altis Law Group, Inc.
- Priority: CN201010604389 20101224
- Main IPC: H01J1/30
- IPC: H01J1/30 ; H01J1/02

Abstract:
A field emission cathode device includes a substrate, a metal plate attached to the substrate, at least one electron emitter electrical connected with the metal plate, and a filler. The metal plate defines at least one through hole extending through the metal plate. The at least one electron emitter is fixed between the substrate and the metal plate and extends through the at least one through hole. The filler is filled into the at least one through hole to fix the at least one electron emitter.
Public/Granted literature
- US20120161607A1 FIELD EMISSION CATHODE DEVICE AND METHOD FOR MAKING THE SAME Public/Granted day:2012-06-28
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