Invention Grant
- Patent Title: Plasma sources
- Patent Title (中): 等离子体源
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Application No.: US12309461Application Date: 2007-07-06
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Publication No.: US08400063B2Publication Date: 2013-03-19
- Inventor: Gary Proudfoot , Christopher David George , Paulo Eduardo Lima
- Applicant: Gary Proudfoot , Christopher David George , Paulo Eduardo Lima
- Applicant Address: GB Newport, South Wales
- Assignee: Aviza Technology Limited
- Current Assignee: Aviza Technology Limited
- Current Assignee Address: GB Newport, South Wales
- Agency: Volentine & Whitt, PLLC
- Priority: GB0614500.7 20060721
- International Application: PCT/GB2007/002550 WO 20070706
- International Announcement: WO2008/009892 WO 20080124
- Main IPC: H01J7/24
- IPC: H01J7/24 ; H05B31/26
Abstract:
This invention relates to a plasma source in the form of plasma generator (13) which utilizes an antenna (11) and an RF source (12). The generated plasma flows into a chamber (14) and ions are accelerated out of the chamber (14) by grid (15). A body 16 is located in the volume for creating local losses and thereby reducing local plasma density.
Public/Granted literature
- US20100108905A1 PLASMA SOURCES Public/Granted day:2010-05-06
Information query
