Invention Grant
US08400610B2 Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
有权
在浸没式光刻机中的晶片更换期间将浸没流体保持在光学组件附近的装置和方法
- Patent Title: Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
- Patent Title (中): 在浸没式光刻机中的晶片更换期间将浸没流体保持在光学组件附近的装置和方法
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Application No.: US13532195Application Date: 2012-06-25
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Publication No.: US08400610B2Publication Date: 2013-03-19
- Inventor: Alex Poon , Leonard Kho , Gaurav Keswani , Derek Coon , Daishi Tanak
- Applicant: Alex Poon , Leonard Kho , Gaurav Keswani , Derek Coon , Daishi Tanak
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Main IPC: G03B27/32
- IPC: G03B27/32 ; G03B27/42 ; G03B27/52
Abstract:
Apparatus and methods keep immersion liquid in a space adjacent to an optical assembly. An optical assembly projects an image onto a substrate supported adjacent to the optical assembly by a substrate table. An insertion member insertable into the space between the optical assembly and the substrate, the substrate table, or both, divides the immersion liquid into a first portion and a second portion, the first portion disposed between the optical assembly and the insertion member, and the second portion disposed between the insertion member and the substrate, the substrate table, or both. The insertion member keeps the optical assembly in contact with the first portion when the substrate is moved away from being disposed adjacent to the optical assembly.
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