Invention Grant
US08400612B2 Wavefront aberration measurement apparatus, exposure apparatus, and method of manufacturing device 有权
波前像差测量装置,曝光装置和制造装置的方法

Wavefront aberration measurement apparatus, exposure apparatus, and method of manufacturing device
Abstract:
A measurement apparatus, which measures a wavefront aberration of an optical system to be measured, comprises: a calculation unit configured to calculate the wavefront aberration based on an interference fringe generated by light which passed through the optical system to be measured; and a determination unit configured to calculate an evaluation value indicating a wavefront state based on the wavefront aberration calculated by the calculation unit, and determine the calculated wavefront aberration as the wavefront aberration of the optical system if the evaluation value falls within an allowable range.
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