Invention Grant
- Patent Title: Wavefront aberration measurement apparatus, exposure apparatus, and method of manufacturing device
- Patent Title (中): 波前像差测量装置,曝光装置和制造装置的方法
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Application No.: US12793873Application Date: 2010-06-04
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Publication No.: US08400612B2Publication Date: 2013-03-19
- Inventor: Kazuki Yamamoto , Yoshinori Ohsaki
- Applicant: Kazuki Yamamoto , Yoshinori Ohsaki
- Applicant Address: JP
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2009-137723 20090608
- Main IPC: G03B27/68
- IPC: G03B27/68

Abstract:
A measurement apparatus, which measures a wavefront aberration of an optical system to be measured, comprises: a calculation unit configured to calculate the wavefront aberration based on an interference fringe generated by light which passed through the optical system to be measured; and a determination unit configured to calculate an evaluation value indicating a wavefront state based on the wavefront aberration calculated by the calculation unit, and determine the calculated wavefront aberration as the wavefront aberration of the optical system if the evaluation value falls within an allowable range.
Public/Granted literature
- US20100309448A1 WAVEFRONT ABERRATION MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE Public/Granted day:2010-12-09
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