Invention Grant
US08400837B2 Semiconductor memory device with memory cells having charge accumulation layer
有权
具有存储单元的半导体存储器件具有电荷累积层
- Patent Title: Semiconductor memory device with memory cells having charge accumulation layer
- Patent Title (中): 具有存储单元的半导体存储器件具有电荷累积层
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Application No.: US12797965Application Date: 2010-06-10
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Publication No.: US08400837B2Publication Date: 2013-03-19
- Inventor: Toshiaki Edahiro
- Applicant: Toshiaki Edahiro
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2009-147856 20090622
- Main IPC: G11C16/06
- IPC: G11C16/06

Abstract:
According to one embodiment, a semiconductor memory device includes memory cells, a memory cell array, a word line, a bit line, a source line, a row decoder, a sense amplifier, and a first MOS transistor. The word line is connected to gates of the memory cells. The bit line is electrically connected to drains of the memory cells. The source line is electrically connected to sources of the memory cells. The row decoder selects the word line. The sense amplifier senses and amplifies data read onto the bit line in a read operation. The first MOS transistor is capable of connecting a well region where the memory cells are formed with the source line and is arranged between the row decoder or the sense amplifier and the memory cell array.
Public/Granted literature
- US20100322011A1 SEMICONDUCTOR MEMORY DEVICE WITH MEMORY CELLS HAVING CHARGE ACCUMULATION LAYER Public/Granted day:2010-12-23
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