According to one embodiment, a nonvolatile semiconductor memory device includes a memory unit and a control unit. The memory unit includes a charge storage film, a first insulating film provided adjacent to one surface of the charge storage film, a second insulating film provided adjacent to one other surface of the charge storage film, a semiconductor portion provided adjacent to the first insulating film and a plurality of electrode portions provided adjacent to the second insulating film. The control unit performs a control of applying a first voltage to electrode portions adjacent to each other in one direction at different timing respectively, in an erasing. The erasing is performed by at least one selected from injecting electron holes into the charge storage film and removing electrons from the charge storage film. The first voltage is applied from one of the electrode portions to the charge storage film to be erased.