Invention Grant
US08402399B2 Method and system for computing fourier series coefficients for mask layouts using FFT
失效
使用FFT计算掩模布局的傅立叶系列系数的方法和系统
- Patent Title: Method and system for computing fourier series coefficients for mask layouts using FFT
- Patent Title (中): 使用FFT计算掩模布局的傅立叶系列系数的方法和系统
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Application No.: US13082440Application Date: 2011-04-08
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Publication No.: US08402399B2Publication Date: 2013-03-19
- Inventor: Paul T Hurley , Krzysztof Kryszczuk , Robin Scheibler , Davide Schipani
- Applicant: Paul T Hurley , Krzysztof Kryszczuk , Robin Scheibler , Davide Schipani
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agent Vazken Alexanian
- Priority: EP10161674 20100430
- Main IPC: G06F17/50
- IPC: G06F17/50
Abstract:
A method and system for computing Fourier coefficients for a Fourier representation of a mask transmission function for a lithography mask. The method includes: sampling a polygon of a mask pattern of the lithography mask to obtain an indicator function which defines the polygon, performing a Fourier Transform on the indicator function to obtain preliminary Fourier coefficients, and scaling the Fourier coefficients for the Fourier representation of the mask transmission function, where at least one of the steps is carried out using a computer device.
Public/Granted literature
- US20110271240A1 METHOD AND SYSTEM FOR COMPUTING FOURIER SERIES COEFFICIENTS FOR MASK LAYOUTS USING FFT Public/Granted day:2011-11-03
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