Invention Grant
- Patent Title: Process for producing polycrystalline bulk semiconductor
- Patent Title (中): 多晶体半导体生产工艺
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Application No.: US12130863Application Date: 2008-05-30
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Publication No.: US08404043B2Publication Date: 2013-03-26
- Inventor: Kozo Fujiwara , Kazuo Nakajima
- Applicant: Kozo Fujiwara , Kazuo Nakajima
- Applicant Address: JP
- Assignee: Tohoku University
- Current Assignee: Tohoku University
- Current Assignee Address: JP
- Agency: Hayes Soloway P.C.
- Priority: JP2005-345042 20051130
- Main IPC: C30B11/00
- IPC: C30B11/00

Abstract:
A high-quality polycrystalline bulk semiconductor having a large crystal grain size is produced by the casting method in which growth is regulated so as to proceed in the same plane direction, i.e., the {110}; plane or {112} plane is disclosed. The process, which is for producing a polycrystalline bulk semiconductor, comprises: a step in which a melt of a semiconductor selected among Si, Ge, and SiGe is held in a crucible; a step in which a bottom part of the crucible is cooled to give a temperature gradient and that part of the melt which is located directly on the crucible bottom is rapidly cooled in the beginning of growth to supercool the melt around the crucible bottom; a step in which the crucible is cooled to grow nuclei on the crucible bottom due to the supercooled state of the melt around the crucible bottom and thereby grow dendritic crystals along the crucible bottom; and a step in which a polycrystalline bulk of the semiconductor is then grown on the upper side of the dendritic crystals.
Public/Granted literature
- US20090000536A1 PROCESS FOR PRODUCING POLYCRYSTALLINE BULK SEMICONDUCTOR Public/Granted day:2009-01-01
Information query
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