Invention Grant
- Patent Title: Electron beam vapor deposition apparatus and method
- Patent Title (中): 电子束蒸镀装置及方法
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Application No.: US12211404Application Date: 2008-09-16
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Publication No.: US08404047B2Publication Date: 2013-03-26
- Inventor: James W. Neal , Michael J. Maloney , David A. Litton , Christopher Masucci
- Applicant: James W. Neal , Michael J. Maloney , David A. Litton , Christopher Masucci
- Applicant Address: US CT Hartford
- Assignee: United Technologies Corporation
- Current Assignee: United Technologies Corporation
- Current Assignee Address: US CT Hartford
- Agency: Carlson, Gaskey & Olds PC
- Main IPC: C23C16/00
- IPC: C23C16/00

Abstract:
An electron beam vapor deposition apparatus includes a coating chamber having a first chamber section with a first coating zone for depositing a first coating and a second chamber section with a second coating zone for depositing a second coating. At least one electron beam source is associated with the first chamber section and the second chamber section. A first crucible is adjacent to the first coating zone for presenting a first source coating material, and a second crucible is adjacent to the second coating zone for presenting a second source coating material. A transport is operative to move a work piece between the first coating zone of the first chamber section and the second coating zone of the second chamber section.
Public/Granted literature
- US20100068417A1 ELECTRON BEAM VAPOR DEPOSITION APPARATUS AND METHOD Public/Granted day:2010-03-18
Information query
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