Invention Grant
- Patent Title: Alternating self-assembling morphologies of diblock copolymers controlled by variations in surfaces
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Application No.: US11761589Application Date: 2007-06-12
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Publication No.: US08404124B2Publication Date: 2013-03-26
- Inventor: Dan B. Millward , Donald Westmoreland , Gurtej Sandhu
- Applicant: Dan B. Millward , Donald Westmoreland , Gurtej Sandhu
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: TraskBritt
- Main IPC: B44C1/22
- IPC: B44C1/22 ; B82B3/00 ; H01L21/302 ; B82Y40/00
Abstract:
Methods for fabricating sublithographic, nanoscale microstructures arrays including openings and linear microchannels utilizing self-assembling block copolymers, and films and devices formed from these methods are provided. In some embodiments, the films can be used as a template or mask to etch openings in an underlying material layer.
Public/Granted literature
- US08123962B2 Alternating self-assembling morphologies of diblock copolymers controlled by variations in surfaces Public/Granted day:2012-02-28
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