Invention Grant
- Patent Title: Method of aligning photomask with base material and method of manufacturing printed circuit board
- Patent Title (中): 将光掩模与基材对齐的方法和制造印刷电路板的方法
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Application No.: US13085269Application Date: 2011-04-12
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Publication No.: US08404410B2Publication Date: 2013-03-26
- Inventor: Kousuke Murakami , Akira Arima , Tomohiro Hattori , Shuuhei Miyazaki
- Applicant: Kousuke Murakami , Akira Arima , Tomohiro Hattori , Shuuhei Miyazaki
- Applicant Address: JP Osaka
- Assignee: Nitto Denko Corporation
- Current Assignee: Nitto Denko Corporation
- Current Assignee Address: JP Osaka
- Agency: Panitch Schwarze Belisario & Nadel LLP
- Priority: JP2010-098492 20100422
- Main IPC: G03F9/00
- IPC: G03F9/00
Abstract:
An exposure system includes an exposure device and an image processing device. The exposure device includes a plurality of cameras. Each of the cameras is configured so as to be selectively set to a full scan mode and a partial scan mode. The camera transmits all of obtained image data in the full scan mode, and extracts part of the obtained image data and transmits the partial image data in the partial scan mode. The image processing device paratactically performs processing using the image data transmitted from the camera and processing using the image data transmitted from the camera.
Public/Granted literature
- US20110262869A1 METHOD OF ALIGNING PHOTOMASK WITH BASE MATERIAL AND METHOD OF MANUFACTURING PRINTED CIRCUIT BOARD Public/Granted day:2011-10-27
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