Invention Grant
- Patent Title: Positive resist composition, method of forming resist pattern using the same, and fluorine-containing polymeric compound
- Patent Title (中): 正型抗蚀剂组合物，使用其形成抗蚀剂图案的方法和含氟聚合物
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Application No.: US12824089Application Date: 2010-06-25
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Publication No.: US08404428B2Publication Date: 2013-03-26
- Inventor: Tasuku Matsumiya , Daiju Shiono , Tomoyuki Hirano , Takahiro Dazai
- Applicant: Tasuku Matsumiya , Daiju Shiono , Tomoyuki Hirano , Takahiro Dazai
- Applicant Address: JP Kawasaki-shi
- Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee Address: JP Kawasaki-shi
- Agency: Knobbe Martens Olson & Bear LLP
- Priority: JPP2009-159073 20090703
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/033 ; G03F7/039 ; G03F7/26
Abstract:
A fluorine-containing polymeric compound which contains a structural unit (f1) that is decomposable in an alkali developing solution as a block copolymer portion, a base component (A) that exhibits increased solubility in an alkali developing solution under the action of acid, and an acid generator component (B) that generates acid upon exposure.
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