Invention Grant
US08404430B2 Multi-chip reticle photomasks 有权
多芯片光罩光掩模

Multi-chip reticle photomasks
Abstract:
A multi-chip reticle, methods of designing and fabricating multi-chip reticles, a system for designing a multi-chip reticle, and a method of fabricating integrated circuit chips using the multi-chip reticle. The multi-chip reticle includes a transparent substrate having two or more separate chip images arranged in an array, each chip image of said two or more chip images having only one type of reticle image, wherein at least two of said two more chip images have different types of reticle images.
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