Invention Grant
- Patent Title: Photolytic acid-generating polymers and monomers for their construction
- Patent Title (中): 光解酸产生聚合物和单体用于其结构
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Application No.: US12869308Application Date: 2010-08-26
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Publication No.: US08404795B2Publication Date: 2013-03-26
- Inventor: Robert L. Brainard
- Applicant: Robert L. Brainard
- Applicant Address: US NY Albany
- Assignee: The Research Foundation for the State University of New York
- Current Assignee: The Research Foundation for the State University of New York
- Current Assignee Address: US NY Albany
- Agency: Heslin Rothenberg Farley & Mesiti P.C.
- Main IPC: C08G73/00
- IPC: C08G73/00
Abstract:
Polymers for photoresists and monomers for incorporation into those polymers are disclosed. The polymers comprise a photoacid generator (PAG) component and at least a second component that is photolytically stable and acid-stable. The polymers may also contain a third, acid-labile component. The photoacid generator is based on N-sulfoxyimides and related moieties that contain photolabile oxygen-heteroatom and oxygen-aromatic carbon bonds.
Public/Granted literature
- US20110130538A1 PHOTOLYTIC ACID-GENERATING POLYMERS AND MONOMERS FOR THEIR CONSTRUCTION Public/Granted day:2011-06-02
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