Invention Grant
- Patent Title: Charged particle beam apparatus
- Patent Title (中): 带电粒子束装置
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Application No.: US12554275Application Date: 2009-09-04
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Publication No.: US08405026B2Publication Date: 2013-03-26
- Inventor: Tomoyasu Shojo , Muneyuki Fukuda , Naomasa Suzuki , Noritsugu Takahashi
- Applicant: Tomoyasu Shojo , Muneyuki Fukuda , Naomasa Suzuki , Noritsugu Takahashi
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2008-228609 20080905
- Main IPC: H01J3/14
- IPC: H01J3/14 ; G01N23/00

Abstract:
Disclosed herewith is a charged particle beam apparatus capable of controlling each of the probe current and the objective divergence angle to obtain a desired probe current and a desired objective divergence angle in accordance with the diameter of the subject objective aperture. The apparatus is configured to include an objective aperture between first and second condenser lenses to calculate and set a control value of a first condenser lens in accordance with the diameter of the hole of the objective aperture so as to obtain a desired probe current and calculate a control value of a second condenser lens setting device in accordance with the diameter of the hole of the objective divergence angle and the control value of the second condenser lens setting device, thereby setting the calculated control value for the second condenser lens setting device to control the objective divergence angle.
Public/Granted literature
- US20100059676A1 CHARGED PARTICLE BEAM APPARATUS Public/Granted day:2010-03-11
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