Invention Grant
- Patent Title: Thin film transistor array substrate and manufacturing method thereof
- Patent Title (中): 薄膜晶体管阵列基板及其制造方法
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Application No.: US13366988Application Date: 2012-02-06
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Publication No.: US08405082B2Publication Date: 2013-03-26
- Inventor: Dong-Gyu Kim
- Applicant: Dong-Gyu Kim
- Applicant Address: KR Yongin, Gyeonggi-Do
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin, Gyeonggi-Do
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2008-011757 20081125
- Main IPC: H01L29/786
- IPC: H01L29/786

Abstract:
A thin film transistor array substrate includes a gate line disposed on a substrate, the gate line comprising a gate electrode including a lower film and an upper film thicker than the lower film, a gate insulating layer formed on the gate line, a semiconductor layer formed on the gate insulating layer, an ohmic contact layer formed on the semiconductor layer, a data line electrically connected to a source electrode and a drain electrode formed on the ohmic contact layer, the lower film of the gate line is in contact with the gate insulating layer at a crossing portion of the gate line and the data line and the heights of the source electrode and the drain electrode are substantially the same as or less than a height of the semiconductor layer.
Public/Granted literature
- US20120132915A1 THIN FILM TRANSISTOR ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF Public/Granted day:2012-05-31
Information query
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