Invention Grant
- Patent Title: Field effect transistor having multiple conduction states
- Patent Title (中): 具有多个导通状态的场效应晶体管
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Application No.: US11160055Application Date: 2005-06-07
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Publication No.: US08405165B2Publication Date: 2013-03-26
- Inventor: Dureseti Chidambarrao , David M. Onsongo , David R. Hanson
- Applicant: Dureseti Chidambarrao , David M. Onsongo , David R. Hanson
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agent Daryl K. Neff; H. Daniel Schnurmann
- Main IPC: H01L31/00
- IPC: H01L31/00

Abstract:
An FET including a gate conductor overlying a channel has first and second threshold voltages, respectively of a first and a second magnitude. When the second magnitude exceeds the first magnitude, both threshold voltages become effective concurrently. The FET operates responsive to a gate-source voltage between the gate conductor and source in states that include a non-conductive state. When the magnitude of the gate-source voltage is lower than the first and second magnitudes, the source-drain current is negligible. The first conductive state when the magnitude of the gate-source voltage exceeds the first magnitude and is lower than the second magnitude, the source-drain current operates at ten or more times exceeding the negligible value. When the second conductive state exceeds the magnitude of the gate-source voltage and exceeds the first and second magnitude, the state the source-drain current has a second operating value ten or more times higher than the first.
Public/Granted literature
- US20060273393A1 STRUCTURE AND METHOD OF MAKING FIELD EFFECT TRANSISTOR HAVING MULTIPLE CONDUCTION STATES Public/Granted day:2006-12-07
Information query
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