Invention Grant
- Patent Title: Component having a silicon carbide coated via
- Patent Title (中): 具有碳化硅涂层通孔的部件
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Application No.: US12998868Application Date: 2009-10-20
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Publication No.: US08405190B2Publication Date: 2013-03-26
- Inventor: Achim Trautmann , Thorsten Mueller
- Applicant: Achim Trautmann , Thorsten Mueller
- Applicant Address: DE Stuttgart
- Assignee: Robert Bosch GmbH
- Current Assignee: Robert Bosch GmbH
- Current Assignee Address: DE Stuttgart
- Agency: Kenyon & Kenyon LLP
- Priority: DE102008054765 20081216
- International Application: PCT/EP2009/063733 WO 20091020
- International Announcement: WO2010/069642 WO 20100624
- Main IPC: H01L29/40
- IPC: H01L29/40 ; H01L23/053 ; H01L23/12 ; H01L23/48 ; H01L23/52

Abstract:
A component including a via for electrical connection between a first and a second plane of a substrate is provided. The substrate has a borehole having an inner wall that is coated with a conductive layer made of an electrically conductive material, an intermediate layer being disposed between the inner wall and the conductive layer. The intermediate layer includes electrically insulating SiC.
Public/Granted literature
- US20120038049A1 COMPONENT HAVING A VIA, AND A METHOD FOR MANUFACTURING SUCH A COMPONENT Public/Granted day:2012-02-16
Information query
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