Invention Grant
US08405816B2 Pattern formation method, pattern formation apparatus, exposure method, exposure apparatus, and device manufacturing method 有权
图案形成方法,图案形成装置,曝光方法,曝光装置和装置制造方法

  • Patent Title: Pattern formation method, pattern formation apparatus, exposure method, exposure apparatus, and device manufacturing method
  • Patent Title (中): 图案形成方法,图案形成装置,曝光方法,曝光装置和装置制造方法
  • Application No.: US12330870
    Application Date: 2008-12-09
  • Publication No.: US08405816B2
    Publication Date: 2013-03-26
  • Inventor: Shigeru HirukawaSoichi Owa
  • Applicant: Shigeru HirukawaSoichi Owa
  • Applicant Address: JP Tokyo
  • Assignee: Nikon Corporation
  • Current Assignee: Nikon Corporation
  • Current Assignee Address: JP Tokyo
  • Priority: JP2006-160886 20060609
  • Main IPC: G03B27/42
  • IPC: G03B27/42
Pattern formation method, pattern formation apparatus, exposure method, exposure apparatus, and device manufacturing method
Abstract:
A drive system determines a combination of basic patterns (type of basic patterns to be generated and the number of pulses of each basic pattern) based on design data of patterns and pattern combination information stored in a memory. Then, based on the determined result, each micro mirror of a variable molding mask is individually controlled such that a plurality of basic patterns are sequentially generated according to each of the number of pulses, and each basic pattern generated by the variable molding mask is sequentially image-formed on a plate via a projection optical system. Thus, a pattern with a desired line width corresponding to the design data is formed at a desired position on the object with a good accuracy.
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