Invention Grant
US08405907B2 Method for correcting optical proximity effects 有权
光学邻近效应校正方法

Method for correcting optical proximity effects
Abstract:
A system and associated method employ a first projection objective including at least one optical proximity correction (OPC) filter with a filter function adapted to a particular pattern. The first projection objective has at least essentially the same imaging properties as a second projection objective in the system, for the particular pattern, to which the filter function of the optical proximity correction (OPC) filter is adapted. The first projection objective differs from the second projection objective with respect to optical imaging properties for the particular pattern when the optical proximity correction (OPC) filter is not present in the first projection objective.
Public/Granted literature
Information query
Patent Agency Ranking
0/0