Invention Grant
- Patent Title: Memory devices and methods of operating the same
- Patent Title (中): 内存设备及操作方法
-
Application No.: US12801830Application Date: 2010-06-28
-
Publication No.: US08406032B2Publication Date: 2013-03-26
- Inventor: Seung-eon Ahn , Young-bae Kim
- Applicant: Seung-eon Ahn , Young-bae Kim
- Applicant Address: KR Gyeonggi-Do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-Do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2009-0130035 20091223
- Main IPC: G11C11/22
- IPC: G11C11/22

Abstract:
Memory devices and methods of operating the same. A memory cell of a memory device may include a ferroelectric layer and a semiconductor layer bonded to each other. The ferroelectric layer may be of a p-type and the semiconductor layer may be of an n-type. The memory cell may have a switching characteristic due to a depletion region that exists in a junction between the ferroelectric layer and the semiconductor layer. The memory device may be a device writing data using a polarization change of the ferroelectric layer.
Public/Granted literature
- US20110149633A1 Memory devices and methods of operating the same Public/Granted day:2011-06-23
Information query