Invention Grant
- Patent Title: Nitride semiconductor laser element
- Patent Title (中): 氮化物半导体激光元件
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Application No.: US12902974Application Date: 2010-10-12
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Publication No.: US08406264B2Publication Date: 2013-03-26
- Inventor: Shingo Masui
- Applicant: Shingo Masui
- Applicant Address: JP Anan-shi
- Assignee: Nichia Corporation
- Current Assignee: Nichia Corporation
- Current Assignee Address: JP Anan-shi
- Agency: Global IP Counselors, LLP
- Priority: JP2007-186432 20070718; JP2008-182302 20080714
- Main IPC: H01S5/125
- IPC: H01S5/125 ; H01S5/183

Abstract:
A nitride semiconductor laser element includes a laminate. The laminate includes on a substrate a first conductivity type nitride semiconductor layer, an active layer, and a second conductivity type nitride semiconductor layer, and constitutes a cavity resonator. The laminate includes an element region, an exposed region and an island layer. The element region is a region in which the laser element is formed. The exposed region is a region in which at least the first conductivity type nitride semiconductor layer is exposed on both sides of the element region in the cavity direction, and which is provided continuously in a cavity resonating direction of the laser element. The island layer is separated from the element region by the exposed region, and that is disposed in a corner of the nitride semiconductor laser element.
Public/Granted literature
- US20110026554A1 NITRIDE SEMICONDUCTOR LASER ELEMENT Public/Granted day:2011-02-03
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