To provide an inter-pattern feature corresponding device (1) for determining a feature correspondence relationship with high accuracy even if a pattern to be collated has distortion. The inter-pattern feature corresponding device (1) includes a means (11) for generating a proximity feature point group in which the feature points are positionally proximate to each other in a pattern and a location relationship numeric number group indicating the location relationship between the feature points of the proximity feature point group as feature point group locations, a means (12) for comparing the generated location relationship numeric numbers to detect the corresponding feature point group location candidates, a means (13) for comparing the location relationship numeric numbers between a feature point of each feature point group location of the corresponding feature point group location candidates and feature points which are proximate to the feature point group locations, adding the corresponding proximity feature points to the corresponding feature point group location candidates, and updating the corresponding feature point group location candidates, a means (14) for examining the associated corresponding feature point candidates of the updated corresponding feature point group location candidates to set the associated corresponding feature points of the corresponding feature point group location candidates, and a means (15) for examining the corresponding feature point group location candidates to set inter-pattern corresponding feature points.