Invention Grant
US08406527B2 Pattern model positioning method in image processing, image processing apparatus, image processing program, and computer readable recording medium 有权
图像处理中的图案模型定位方法,图像处理装置,图像处理程序和计算机可读记录介质

  • Patent Title: Pattern model positioning method in image processing, image processing apparatus, image processing program, and computer readable recording medium
  • Patent Title (中): 图像处理中的图案模型定位方法,图像处理装置,图像处理程序和计算机可读记录介质
  • Application No.: US12504071
    Application Date: 2009-07-16
  • Publication No.: US08406527B2
    Publication Date: 2013-03-26
  • Inventor: Manabu Kido
  • Applicant: Manabu Kido
  • Applicant Address: JP Osaka
  • Assignee: Keyence Corporation
  • Current Assignee: Keyence Corporation
  • Current Assignee Address: JP Osaka
  • Agency: Kilyk & Bowersox, P.L.L.C.
  • Priority: JP2008-206478 20080809; JP2008-267979 20081016
  • Main IPC: G06K9/46
  • IPC: G06K9/46
Pattern model positioning method in image processing, image processing apparatus, image processing program, and computer readable recording medium
Abstract:
There is provided a matching method, capable of positioning with higher accuracy at higher speed. The method includes the steps of: constructing a pattern model of a registered image in which a plurality of reference points are set on an extracted contour and a corresponding point search line having a predetermined length and passing through each reference point; acquiring an image and acquiring an initial position corresponding to the registered image to arrange the corresponding point search line of the pattern model; finding a corresponding point on the image corresponding to each reference point with regard to each corresponding point search line at a position along the corresponding point search line on the image; and regarding a relation between each reference point and the corresponding point as an evaluation value and performing fine positioning such that an accumulated value of the evaluation values becomes minimal or maximal.
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