Invention Grant
- Patent Title: Method and system for context-specific mask inspection
- Patent Title (中): 用于上下文特定掩模检查的方法和系统
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Application No.: US11760715Application Date: 2007-06-08
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Publication No.: US08407627B2Publication Date: 2013-03-26
- Inventor: Robert C. Pack , Louis K. Scheffer
- Applicant: Robert C. Pack , Louis K. Scheffer
- Applicant Address: US CA San Jose
- Assignee: Cadence Design Systems, Inc.
- Current Assignee: Cadence Design Systems, Inc.
- Current Assignee Address: US CA San Jose
- Agency: Vista IP Law Group, LLP
- Main IPC: G06F17/50
- IPC: G06F17/50
Abstract:
A method for inspecting lithography masks includes generating integrated circuit design data and using context information from the integrated circuit design data to inspect a mask.
Public/Granted literature
- US20070233419A1 Method and System for Context-Specific Mask Inspection Public/Granted day:2007-10-04
Information query
