Invention Grant
US08408277B2 Method and apparatus for production of rotatable sputtering targets
有权
用于生产可旋转溅射靶的方法和装置
- Patent Title: Method and apparatus for production of rotatable sputtering targets
- Patent Title (中): 用于生产可旋转溅射靶的方法和装置
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Application No.: US13501358Application Date: 2010-10-12
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Publication No.: US08408277B2Publication Date: 2013-04-02
- Inventor: Anthony Mendel , George E. Whalen
- Applicant: Anthony Mendel , George E. Whalen
- Agency: Cantor Colburn LLP
- Priority: LU91615 20091012; LU91635 20091230
- International Application: PCT/EP2010/065257 WO 20101012
- International Announcement: WO2011/045304 WO 20110421
- Main IPC: B22D19/16
- IPC: B22D19/16
Abstract:
The present invention relates to a method and apparatus for producing rotatable sputtering targets by means of continuous casting. Target material is deposited around a cylindrical target holder (14) by means of a movable mold (30) surrounding the target holder. The mold (30) is fed with molten metal while it is translated along the target holder to progressively form the layer of molten metal on the outer surface of the target holder.
Public/Granted literature
- US20120186770A1 METHOD AND APPARATUS FOR PRODUCTION OF ROTATABLE SPUTTERING TARGETS Public/Granted day:2012-07-26
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