Invention Grant
US08408858B2 Substrate processing system having improved substrate transport system 有权
具有改进的基板输送系统的基板处理系统

Substrate processing system having improved substrate transport system
Abstract:
A substrate processing system includes a first load lock, a process chamber having a first opening to allow an exchange of a substrate between the first load lock and the first process chamber, first rollers in the process chamber; and second rollers in the first load lock, wherein the first rollers and the second rollers are configured to transport a substrate thereon through the first opening between the first load lock and the process chamber. At least some of the first rollers and the second rollers are idler rollers.
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