Invention Grant
US08409071B2 Method and apparatus for treatment planning using implanted radioactive sources
有权
使用植入放射源进行治疗计划的方法和装置
- Patent Title: Method and apparatus for treatment planning using implanted radioactive sources
- Patent Title (中): 使用植入放射源进行治疗计划的方法和装置
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Application No.: US12413256Application Date: 2009-03-27
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Publication No.: US08409071B2Publication Date: 2013-04-02
- Inventor: Vibha Chaswal , Bruce R. Thomadsen , Douglass L. Henderson
- Applicant: Vibha Chaswal , Bruce R. Thomadsen , Douglass L. Henderson
- Applicant Address: US WI Madison
- Assignee: Wisconsin Alumni Research Foundation
- Current Assignee: Wisconsin Alumni Research Foundation
- Current Assignee Address: US WI Madison
- Agency: Boyle Fredrickson, S.C.
- Main IPC: A61M36/04
- IPC: A61M36/04

Abstract:
A pre-computed importance function providing ex ante assessment of optimal placement of a single radioactive source is used for sequential placement of multiple radioactive sources. As each source is placed, the importance function may be modified to reflect the dose implemented by that source and all sources already placed. The greedy algorithm employed by this technique makes possible optimization of additional dimensions of treatment planning including, using directional and isotropic sources, using different source isotopes, using optimum source strengths, using source locations that are not on the regular grid and using a single movable source for variable times at different locations.
Public/Granted literature
- US20090182187A1 METHOD AND APPARATUS FOR TREATMENT PLANNING USING IMPLANTED RADIOACTIVE SOURCES Public/Granted day:2009-07-16
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