Invention Grant
- Patent Title: Production process for structure and production process for liquid discharge head
- Patent Title (中): 液体排放头结构和生产工艺的生产工艺
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Application No.: US12731563Application Date: 2010-03-25
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Publication No.: US08409454B2Publication Date: 2013-04-02
- Inventor: Etsuko Hino , Shoji Shiba
- Applicant: Etsuko Hino , Shoji Shiba
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2009-088966 20090401
- Main IPC: G01D15/00
- IPC: G01D15/00 ; G11B5/127

Abstract:
A production process for a structure includes preparing a substrate on which a first layer and a second layer are provided in this order; forming a second mold, which is a part of a mold member serving as a mold for forming the structure, from the second layer; etching the first layer using the second mold as a mask and thereby forming a first mold, which is another part of the mold member from the first layer; providing a coating layer which serves as the structure to cover the first mold and the second mold; and removing the first mold and the second mold and thereby forming the structure.
Public/Granted literature
- US20100252529A1 PRODUCTION PROCESS FOR STRUCTURE AND PRODUCTION PROCESS FOR LIQUID DISCHARGE HEAD Public/Granted day:2010-10-07
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