Invention Grant
- Patent Title: Laser pattern mask and method for fabricating the same
- Patent Title (中): 激光图案掩模及其制造方法
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Application No.: US12973448Application Date: 2010-12-20
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Publication No.: US08409771B2Publication Date: 2013-04-02
- Inventor: Sun-Ju Ku , Jun-Ho Choi
- Applicant: Sun-Ju Ku , Jun-Ho Choi
- Applicant Address: KR Seoul
- Assignee: LG Display Co., Ltd.
- Current Assignee: LG Display Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: KR10-2010-0096220 20101004
- Main IPC: G03F1/22
- IPC: G03F1/22

Abstract:
The present invention relates to a laser pattern mask, and a method for fabricating the same, which can prevent a laser pattern mask from being damaged by coating a protective film on a surface of a laser pattern mask for patterning an entire layer on a mother substrate at a time by laser ablation. The laser pattern mask includes a base substrate, a laser shielding pattern formed of a non-transparent metal on the base substrate to define laser pass through regions, and a protective film formed on an entire surface of the base substrate including the laser shielding pattern.
Public/Granted literature
- US20120082828A1 LASER PATTERN MASK AND METHOD FOR FABRICATING THE SAME Public/Granted day:2012-04-05
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