Invention Grant
US08409783B2 Copolymer, resin composition, spacer for display panel, planarization film, thermosetting protective film, microlens, and process for producing copolymer 有权
共聚物,树脂组合物,显示面板用间隔物,平坦化膜,热固性保护膜,微透镜,以及共聚物的制造方法

  • Patent Title: Copolymer, resin composition, spacer for display panel, planarization film, thermosetting protective film, microlens, and process for producing copolymer
  • Patent Title (中): 共聚物,树脂组合物,显示面板用间隔物,平坦化膜,热固性保护膜,微透镜,以及共聚物的制造方法
  • Application No.: US12680074
    Application Date: 2008-09-29
  • Publication No.: US08409783B2
    Publication Date: 2013-04-02
  • Inventor: Masayuki Endo
  • Applicant: Masayuki Endo
  • Applicant Address: JP Kawasaki-shi
  • Assignee: Tokyo Ohka Kogyo Co., Ltd.
  • Current Assignee: Tokyo Ohka Kogyo Co., Ltd.
  • Current Assignee Address: JP Kawasaki-shi
  • Agency: Knobbe Martens Olson & Bear LLP
  • Priority: JP2007-256352 20070928
  • International Application: PCT/JP2008/067641 WO 20080929
  • International Announcement: WO2009/041681 WO 20090402
  • Main IPC: G03F7/033
  • IPC: G03F7/033 G03F7/004 C08F220/00
Copolymer, resin composition, spacer for display panel, planarization film, thermosetting protective film, microlens, and process for producing copolymer
Abstract:
Without the use of a third monomer, no copolymer practicable as a base polymer for a radiation-sensitive resin composition has been obtained by copolymerizing two ingredients, i.e., a carboxylated monomer and an epoxidized monomer. A carboxylated monomer is reacted with a specific nonpolymerizable compound, and this reaction mixture is then copolymerized with an epoxidized monomer. A radiation-sensitive resin composition and a thermosetting resin composition each containing the resultant copolymer have satisfactory storage stability and are useful as a spacer for liquid-crystal display panels, etc., a planarization film for TFT elements, and a protective film for color filters.
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