Invention Grant
US08409788B2 Laser induced thermal imaging method, method of patterning organic layer using the same and method of fabricating organic light emitting diode display device using the same
有权
激光感应热成像方法,使用该方法的有机层图案化方法以及使用其制造有机发光二极管显示装置的方法
- Patent Title: Laser induced thermal imaging method, method of patterning organic layer using the same and method of fabricating organic light emitting diode display device using the same
- Patent Title (中): 激光感应热成像方法,使用该方法的有机层图案化方法以及使用其制造有机发光二极管显示装置的方法
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Application No.: US12912243Application Date: 2010-10-26
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Publication No.: US08409788B2Publication Date: 2013-04-02
- Inventor: Hyun-Chul Lee , Jin-Han Park , Hyung-Sik Kim , Won-Kyu Lim , Cheol-Lae Roh
- Applicant: Hyun-Chul Lee , Jin-Han Park , Hyung-Sik Kim , Won-Kyu Lim , Cheol-Lae Roh
- Applicant Address: KR Yongin-si
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin-si
- Agency: Christie, Parker & Hale, LLP
- Priority: KR10-2009-0116424 20091130
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A laser induced thermal imaging (LITI) method, a method of patterning an organic layer using the same and a method of manufacturing an organic light emitting diode (OLED) display device using the same. The LITI method includes preparing a substrate including a transfer layer, preparing a donor substrate including a base film and a light-to-heat conversion layer disposed on the base film, aligning the substrate with the donor substrate, and irradiating laser to the base layer of the donor substrate. Here, the laser is irradiated to the base layer in a region excluding a region corresponding to a pattern to be formed on the substrate. Thus, according to the method, regardless of the size of the pattern to be formed and the size of the laser beam, stitching mura can be prevented.
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