Invention Grant
- Patent Title: Solid state light emitting semiconductor structure and epitaxy growth method thereof
- Patent Title (中): 固态发光半导体结构及其外延生长方法
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Application No.: US13443446Application Date: 2012-04-10
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Publication No.: US08409894B2Publication Date: 2013-04-02
- Inventor: Chang-Chin Yu , Mong-Ea Lin
- Applicant: Chang-Chin Yu , Mong-Ea Lin
- Applicant Address: TW Hsinchu
- Assignee: Lextar Electronics Corporation
- Current Assignee: Lextar Electronics Corporation
- Current Assignee Address: TW Hsinchu
- Agency: McClure, Qualey & Rodack, LLP
- Priority: TW100131138A 20110830
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A solid state light emitting semiconductor structure and an epitaxy growth method thereof are provided. The method includes the following steps: A substrate is provided. A plurality of protrusions separated from each other are formed on the substrate. A buffer layer is formed on the protrusions, and fills or partially fills the gaps between the protrusions. A semiconductor epitaxy stacking layer is formed on the buffer layer, wherein the semiconductor epitaxy stacking layer is constituted by a first type semiconductor layer, an active layer and a second type semiconductor layer in sequence.
Public/Granted literature
- US20130048941A1 SOLID STATE LIGHT EMITTING SEMICONDUCTOR STRUCTURE AND EPITAXY GROWTH METHOD THEREOF Public/Granted day:2013-02-28
Information query
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