Invention Grant
US08409905B2 Method of forming display device that includes removing mask to form opening in insulating film
有权
一种形成显示装置的方法,包括去除掩模以在绝缘膜中形成开口
- Patent Title: Method of forming display device that includes removing mask to form opening in insulating film
- Patent Title (中): 一种形成显示装置的方法,包括去除掩模以在绝缘膜中形成开口
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Application No.: US13270271Application Date: 2011-10-11
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Publication No.: US08409905B2Publication Date: 2013-04-02
- Inventor: Koichiro Tanaka
- Applicant: Koichiro Tanaka
- Applicant Address: JP Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Kanagawa-ken
- Agency: Nixon Peabody LLP
- Agent Jeffrey L. Costellia
- Priority: JP2006-231956 20060829
- Main IPC: H01L21/4763
- IPC: H01L21/4763

Abstract:
To improve the use efficiency of materials and provide a technique of fabricating a display device by a simple process. The method includes the steps of providing a mask on a conductive layer, forming an insulating film over the conductive layer provided with the mask, removing the mask to form an insulating layer having an opening; and forming a conductive film in the opening so as to be in contact with the exposed conductive layer, whereby the conductive layer and the conductive film can be electrically connected through the insulating layer. The shape of the opening reflects the shape of the mask. A mask having a columnar shape (e.g., a prism, a cylinder, or a triangular prism), a needle shape, or the like can be used.
Public/Granted literature
- US20120028391A1 METHOD OF FABRICATING DISPLAY DEVICE Public/Granted day:2012-02-02
Information query
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