Invention Grant
- Patent Title: Separation apparatus, separation method, and method for manufacturing semiconductor element
- Patent Title (中): 分离装置,分离方法以及半导体元件的制造方法
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Application No.: US13168059Application Date: 2011-06-24
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Publication No.: US08409973B2Publication Date: 2013-04-02
- Inventor: Akihiro Chida , Kaoru Hatano
- Applicant: Akihiro Chida , Kaoru Hatano
- Applicant Address: JP
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP
- Agency: Husch Blackwell LLP
- Priority: JP2010-145260 20100625
- Main IPC: H01L21/304
- IPC: H01L21/304

Abstract:
Objects are to reduce the number of steps in a process for separating a substrate and a semiconductor element, to provide a separation apparatus capable of reducing the number of steps, to suppress manufacturing cost by reducing the number of steps in a separation process, and to improve productivity in manufacturing semiconductor elements. A separation apparatus including a frame body, a porous body having a chamfered, rounded corner portion, a suction unit configured to create suction in the porous body and the frame body, and a jig which includes a unit adopted to press down part of an object to be separated and a unit adopted to lift another part of the object to be separated, and also a separation method and a method for manufacturing a semiconductor element by using the separation apparatus, are provided.
Public/Granted literature
- US20110318906A1 Separation Apparatus, Separation Method, and Method for Manufacturing Semiconductor Element Public/Granted day:2011-12-29
Information query
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