Invention Grant
- Patent Title: Etching composition for etching a transparent electrode
- Patent Title (中): 用于蚀刻透明电极的蚀刻组合物
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Application No.: US12947296Application Date: 2010-11-16
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Publication No.: US08409999B2Publication Date: 2013-04-02
- Inventor: Byeong-Jin Lee , Hong-Sick Park , Sang-Tae Kim , Joon-Woo Lee , Young-Chul Park , Young-Jun Jin , Suck-Jun Lee , Seung-Jae Yang , O-Byoung Kwon , In-Ho Yu , Sang-Hoon Jang , Min-Ki Lim , Hye-Ra Shin , Yu-Jin Lee
- Applicant: Byeong-Jin Lee , Hong-Sick Park , Sang-Tae Kim , Joon-Woo Lee , Young-Chul Park , Young-Jun Jin , Suck-Jun Lee , Seung-Jae Yang , O-Byoung Kwon , In-Ho Yu , Sang-Hoon Jang , Min-Ki Lim , Hye-Ra Shin , Yu-Jin Lee
- Applicant Address: KR
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR
- Agency: Innovation Counsel LLP
- Priority: KR10-2010-0007068 20100126
- Main IPC: H01L21/461
- IPC: H01L21/461
Abstract:
An etchant composition for etching a transparent electrode is provided, the etchant composition includes an inorganic acid, an ammonium (NH4+)-containing compound, a cyclic amine compound, and the remaining amount of water.
Public/Granted literature
- US20110183476A1 ETCHING SOLUTION COMPOSITION AND METHOD OF ETCHING USING THE SAME Public/Granted day:2011-07-28
Information query
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