Invention Grant
- Patent Title: Method for producing photovoltaic cell
- Patent Title (中): 光电池生产方法
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Application No.: US13298535Application Date: 2011-11-17
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Publication No.: US08410000B2Publication Date: 2013-04-02
- Inventor: Youichi Machii , Masato Yoshida , Takeshi Nojiri , Kaoru Okaniwa , Mitsunori Iwamuro , Shuuichirou Adachi , Akihiro Orita , Tetsuya Satou , Keiko Kizawa
- Applicant: Youichi Machii , Masato Yoshida , Takeshi Nojiri , Kaoru Okaniwa , Mitsunori Iwamuro , Shuuichirou Adachi , Akihiro Orita , Tetsuya Satou , Keiko Kizawa
- Applicant Address: JP Tokyo
- Assignee: Hitachi Chemical Company, Ltd.
- Current Assignee: Hitachi Chemical Company, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Miles & Stockbridge P.C.
- Main IPC: H01L21/31
- IPC: H01L21/31

Abstract:
The method for producing a photovoltaic cell includes applying, on a partial region of one surface side of a semiconductor substrate, a first p-type diffusion layer forming composition including a p-type impurity-containing glass powder and a dispersion medium; applying, on at least a region other than the partial region on the surface of the semiconductor substrate, a second p-type diffusion layer forming composition which includes a p-type impurity-containing glass powder and a dispersion medium and in which a concentration of the p-type impurity is lower than that of the first p-type diffusion layer forming composition, where the first p-type diffusion layer forming composition is applied; heat-treating the semiconductor substrate on which the first p-type diffusion layer forming composition and the second p-type diffusion layer forming composition are applied to form a p-type diffusion layer; and forming an electrode on the partial region.
Public/Granted literature
- US20120122264A1 METHOD FOR PRODUCING PHOTOVOLTAIC CELL Public/Granted day:2012-05-17
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