Invention Grant
- Patent Title: Photoelectric conversion device and manufacturing method thereof
- Patent Title (中): 光电转换装置及其制造方法
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Application No.: US12435133Application Date: 2009-05-04
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Publication No.: US08410354B2Publication Date: 2013-04-02
- Inventor: Shunpei Yamazaki
- Applicant: Shunpei Yamazaki
- Applicant Address: JP Atsugi-shi, Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-ken
- Agency: Fish & Richardson P.C.
- Priority: JP2008-123332 20080509
- Main IPC: H01L31/00
- IPC: H01L31/00

Abstract:
Higher conversion efficiency and productivity of photoelectric conversion devices. A semiconductor layer including a first and second crystal regions grown in the layer-deposition direction is provided between an impurity semiconductor layer containing an impurity element imparting one conductivity type and an impurity semiconductor layer containing an impurity element imparting a conductivity type opposite to the one conductivity type. The first crystal region is grown from the interface between one of the impurity semiconductor layers and the semiconductor layer. The second crystal region is grown toward the interface between the semiconductor layer and the other of the impurity semiconductor layers from a position which is away from the interface between the one of the impurity semiconductor layers and the semiconductor layer. The semiconductor layer including the first and second crystal regions which exist in an amorphous structure forms the main part of a region for photoelectric conversion.
Public/Granted literature
- US20090277504A1 PHOTOELECTRIC CONVERSION DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2009-11-12
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