Invention Grant
- Patent Title: Nonvolatile memory device and method of manufacturing the same
- Patent Title (中): 非易失性存储器件及其制造方法
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Application No.: US12813664Application Date: 2010-06-11
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Publication No.: US08410467B2Publication Date: 2013-04-02
- Inventor: Junichi Wada
- Applicant: Junichi Wada
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- Priority: JP2009-187347 20090812
- Main IPC: H01L29/02
- IPC: H01L29/02

Abstract:
According to one embodiment, a nonvolatile memory device includes a first wire, a second wire and a nonvolatile memory cell. The first wire is formed to extend in a first direction, and the second wire is formed at height different from height of the first wire and to extend in a second direction. The nonvolatile memory cell is arranged to be held between the first wire and the second wire in a poison where the first wire and the second wire cross. The nonvolatile memory cell includes a nonvolatile storage layer and a current limiting resistance layer connected in series to the nonvolatile storage layer and having resistance of 1 kilo-ohm to 1 mega-ohm.
Public/Granted literature
- US20110037043A1 NONVOLATILE MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2011-02-17
Information query
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