Invention Grant
- Patent Title: Semiconductor memory device and method for manufacturing same
- Patent Title (中): 半导体存储器件及其制造方法
-
Application No.: US12834390Application Date: 2010-07-12
-
Publication No.: US08410538B2Publication Date: 2013-04-02
- Inventor: Megumi Ishiduki , Yoshiaki Fukuzumi , Ryota Katsumata , Masaru Kidoh , Masaru Kito , Hideaki Aochi
- Applicant: Megumi Ishiduki , Yoshiaki Fukuzumi , Ryota Katsumata , Masaru Kidoh , Masaru Kito , Hideaki Aochi
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2010-060803 20100317
- Main IPC: H01L29/66
- IPC: H01L29/66

Abstract:
According to one embodiment, a semiconductor memory device includes a substrate, a stacked body, a memory film, and a SiGe film. The stacked body includes a plurality of conductive layers and a plurality of insulating layers alternately stacked above the substrate. The memory film includes a charge storage film. The memory film is provided on a sidewall of a memory hole punched through the stacked body. The SiGe film is provided inside the memory film in the memory hole.
Public/Granted literature
- US20110227140A1 SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING SAME Public/Granted day:2011-09-22
Information query
IPC分类: