Invention Grant
US08410538B2 Semiconductor memory device and method for manufacturing same 有权
半导体存储器件及其制造方法

Semiconductor memory device and method for manufacturing same
Abstract:
According to one embodiment, a semiconductor memory device includes a substrate, a stacked body, a memory film, and a SiGe film. The stacked body includes a plurality of conductive layers and a plurality of insulating layers alternately stacked above the substrate. The memory film includes a charge storage film. The memory film is provided on a sidewall of a memory hole punched through the stacked body. The SiGe film is provided inside the memory film in the memory hole.
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