Invention Grant
- Patent Title: Electronic device and method for manufacturing thereof
- Patent Title (中): 电子装置及其制造方法
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Application No.: US12975065Application Date: 2010-12-21
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Publication No.: US08410561B2Publication Date: 2013-04-02
- Inventor: Akira Sato , Toru Watanabe , Shogo Inaba , Takeshi Mori
- Applicant: Akira Sato , Toru Watanabe , Shogo Inaba , Takeshi Mori
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2006-302478 20061108
- Main IPC: H01L31/00
- IPC: H01L31/00

Abstract:
An electronic device, including a substrate, a functional structure constituting a functional element formed on the substrate, and a cover structure forming a cavity portion in which the functional structure is disposed, is disclosed. In the electronic device, the cover structure includes a laminated structure of an interlayer insulating film and a wiring layer, the laminated structure being formed on the substrate in such a way that it surrounds the cavity portion, and the cover structure has an upside cover portion covering the cavity portion from above, the upside cover portion being formed with part of the wiring layer that is disposed above the functional structure.
Public/Granted literature
- US20110089521A1 Electronic Device and Method For Manufacturing Thereof Public/Granted day:2011-04-21
Information query
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