Invention Grant
- Patent Title: Semiconductor device
- Patent Title (中): 半导体器件
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Application No.: US12103857Application Date: 2008-04-16
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Publication No.: US08410577B2Publication Date: 2013-04-02
- Inventor: Katsu Horikoshi , Hisayoshi Uchiyama , Takashi Noma , Yoshinori Seki , Hiroshi Yamada , Shinzo Ishibe , Hiroyuki Shinogi
- Applicant: Katsu Horikoshi , Hisayoshi Uchiyama , Takashi Noma , Yoshinori Seki , Hiroshi Yamada , Shinzo Ishibe , Hiroyuki Shinogi
- Applicant Address: JP Ora-gun US AZ Phoenix
- Assignee: SANYO Semiconductor Co., Ltd.,Semiconductor Components Industries, LLC
- Current Assignee: SANYO Semiconductor Co., Ltd.,Semiconductor Components Industries, LLC
- Current Assignee Address: JP Ora-gun US AZ Phoenix
- Agency: Morrison & Foerster LLP
- Priority: JP2007-112336 20070420
- Main IPC: H01L29/92
- IPC: H01L29/92

Abstract:
The invention provides a semiconductor device which has a capacitor element therein to achieve size reduction of the device, the capacitor element having larger capacitance than conventional. A semiconductor integrated circuit and pad electrodes are formed on the front surface of a semiconductor substrate. A second insulation film is formed on the side and back surfaces of the semiconductor substrate, and a capacitor electrode is formed between the back surface of the semiconductor substrate and the second insulation film, contacting the back surface of the semiconductor substrate. The second insulation film is covered by wiring layers electrically connected to the pad electrodes, and the wiring layers and the capacitor electrode overlap with the second insulation film being interposed therebetween. Thus, the capacitor electrode, the second insulation film and the wiring layers form capacitors.
Public/Granted literature
- US20080258258A1 SEMICONDUCTOR DEVICE Public/Granted day:2008-10-23
Information query
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