Invention Grant
US08411249B2 Surface position detecting apparatus, exposure apparatus, surface position detecting method, and device manufacturing method 有权
表面位置检测装置,曝光装置,表面位置检测方法和装置制造方法

  • Patent Title: Surface position detecting apparatus, exposure apparatus, surface position detecting method, and device manufacturing method
  • Patent Title (中): 表面位置检测装置,曝光装置,表面位置检测方法和装置制造方法
  • Application No.: US12466934
    Application Date: 2009-05-15
  • Publication No.: US08411249B2
    Publication Date: 2013-04-02
  • Inventor: Yasuhiro HidakaMotofusa Ishikawa
  • Applicant: Yasuhiro HidakaMotofusa Ishikawa
  • Applicant Address: JP Tokyo
  • Assignee: Nikon Corporation
  • Current Assignee: Nikon Corporation
  • Current Assignee Address: JP Tokyo
  • Main IPC: G03B27/52
  • IPC: G03B27/52
Surface position detecting apparatus, exposure apparatus, surface position detecting method, and device manufacturing method
Abstract:
An apparatus is provided with a light-sending optical system which makes first light from a first pattern and second light from a second pattern incident to a predetermined surface to project intermediate images of the first and second patterns onto the predetermined surface respectively; a light-receiving optical system which guides the first and second light reflected on the predetermined surface, to first and second observation surfaces to form observation images of the first and second patterns, respectively; and a detecting section which detects position information of the observation images of the first and second patterns on the first and second observation surfaces respectively and which calculates a surface position of the predetermined surface, based on the position information. The light-sending optical system projects the intermediate image of the second pattern as an inverted image in a predetermined direction relative to the intermediate image of the first pattern.
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